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1

Atomic layer deposition of high-quality Al2O3 and Al-doped TiO2 thin films from hydrogen-free precursors

Aarik, Lauri, Arroval, Tõnis, Rammula, Raul, Mändar, Hugo, Sammelselg, Väino, Hudec, Boris, Hušeková, Kristína, Fröhlich, Karol, Aarik, Jaan

Journal:

Thin Solid Films

Year:

2014

Language:

english

File:

PDF, 756 KB

english, 2014

2

Atomic layer deposition of Ru films from bis(2,5-dimethylpyrrolyl)ruthenium and oxygen

Kaupo Kukli, Jaan Aarik, Aleks Aidla, Indrek Jõgi, Tõnis Arroval, Jun Lu, Timo Sajavaara, Mikko Laitinen, Alma-Asta Kiisler, Mikko Ritala, Markku Leskelä, John Peck, Jim Natwora, Joan Geary, Ronald Sp

Journal:

Thin Solid Films

Year:

2012

Language:

english

File:

PDF, 1.53 MB

english, 2012

3

High-power GaInP-AlGaInP quantum-well lasers grown by solid source molecular beam epitaxy

Tappura, K., Aarik, J., Pessa, M.

Journal:

IEEE Photonics Technology Letters

Year:

1996

Language:

english

File:

PDF, 361 KB

english, 1996

4

Morphology and structure of TiO2 thin films grown by atomic layer deposition

Jaan Aarik, Aleks Aidla, Teet Uustare, Väino Sammelselg

Journal:

Journal of Crystal Growth

Year:

1995

Language:

english

File:

PDF, 582 KB

english, 1995

5

Electrical characterization of hafnium oxide and hafnium-rich silicate films grown by atomic layer deposition

S. Dueñas, H. Castán, H. García, J. Barbolla, K. Kukli, J. Aarik, M. Ritala, M. Leskelä

Journal:

Microelectronics Reliability

Year:

2005

Language:

english

File:

PDF, 388 KB

english, 2005

6

Chemical resistance of thin film materials based on metal oxides grown by atomic layer deposition

Sammelselg, Väino, Netšipailo, Ivan, Aidla, Aleks, Tarre, Aivar, Aarik, Lauri, Asari, Jelena, Ritslaid, Peeter, Aarik, Jaan

Journal:

Thin Solid Films

Year:

2013

Language:

english

File:

PDF, 711 KB

english, 2013

7

Atomic layer deposition of high-k dielectrics on carbon nanoparticles

Tamm, Aile, Peikolainen, Anna-Liisa, Kozlova, Jekaterina, Mändar, Hugo, Aidla, Aleks, Rammula, Raul, Aarik, Lauri, Roosalu, Kaspar, Lu, Jun, Hultman, Lars, Koel, Mihkel, Kukli, Kaupo, Aarik, Jaan

Journal:

Thin Solid Films

Year:

2013

Language:

english

File:

PDF, 1.11 MB

english, 2013

8

Influence of process parameters on atomic layer deposition of ZrO2 thin films from CpZr(NMe2)3 and H2O

Aarik, Lauri, Alles, Harry, Aidla, Aleks, Kahro, Tauno, Kukli, Kaupo, Niinistö, Jaakko, Mändar, Hugo, Tamm, Aile, Rammula, Raul, Sammelselg, Väino, Aarik, Jaan

Journal:

Thin Solid Films

Year:

2014

Language:

english

File:

PDF, 1.19 MB

english, 2014

9

Titanium isopropoxide as a precursor for atomic layer deposition: characterization of titanium dioxide growth process

Jaan Aarik, Aleks Aidla, Teet Uustare, Mikko Ritala, Markku Leskelä

Journal:

Applied Surface Science

Year:

2000

Language:

english

File:

PDF, 208 KB

english, 2000

10

Atomic layer deposition of titanium dioxide from TiCl4 and H2O: investigation of growth mechanism

J. Aarik, A. Aidla, H. Mändar, T. Uustare

Journal:

Applied Surface Science

Year:

2001

Language:

english

File:

PDF, 238 KB

english, 2001

11

Properties of tantalum oxide thin films grown by atomic layer deposition

Kaupo Kukli, Jaan Aarik, Aleks Aidla, Oksana Kohan, Teet Uustare, Väino Sammelselg

Journal:

Thin Solid Films

Year:

1995

Language:

english

File:

PDF, 963 KB

english, 1995

12

Energy transfer in the photoexcitation of Sm3+-implanted TiO2 thin films

S. Lange, I. Sildos, V. Kiisk, J. Aarik

Journal:

Materials Science and Engineering: B

Year:

2004

Language:

english

File:

PDF, 138 KB

english, 2004

13

Atomic layer deposition of TiO2 from TiCl4 and O3

Aarik, Lauri, Arroval, Tõnis, Rammula, Raul, Mändar, Hugo, Sammelselg, Väino, Aarik, Jaan

Journal:

Thin Solid Films

Year:

2013

Language:

english

File:

PDF, 1.34 MB

english, 2013

14

[IEEE Conference Digest. ISLC 1998 NARA. 1998 IEEE 16th International Semiconductor Laser Conference - Nara, Japan (4-8 Oct. 1998)] Conference Digest. ISLC 1998 NARA. 1998 IEEE 16th International Semiconductor Laser Conference (Cat. No. 98CH361130) - Tensile-strained single quantum well 808 nm lasers with Al-free active regions and InGaAlP cladding layers grown by solid source MBE

Nabiev, R.F., Aarik, J., Asonen, H., Bournes, P., Corvini, P., Fang, F., Finander, M., Jansen, M., Nappi, J., Rakennus, K., Salokatve, A.

Year:

1998

Language:

english

File:

PDF, 152 KB

english, 1998

15

Oxygen Barrier Properties of Al 2 O 3 - and TiO 2 -coated LDPE Films

Lange, Sven, Arroval, Tõnis, Saar, Rando, Kink, Ilmar, Aarik, Jaan, Krumme, Andres

Journal:

Polymer-Plastics Technology and Engineering

Year:

2015

Language:

english

File:

PDF, 224 KB

english, 2015

16

Photoluminescence of atomic layer deposited ZrO2:Dy3+ thin films

Kiisk, Valter, Tamm, Aile, Utt, Kathriin, Kozlova, Jekaterina, Mändar, Hugo, Puust, Laurits, Aarik, Jaan, Sildos, Ilmo

Journal:

Thin Solid Films

Year:

2015

Language:

english

File:

PDF, 1.15 MB

english, 2015

17

Effect of substrate-enhanced and inhibited growth on atomic layer deposition and properties of aluminum–titanium oxide films

Arroval, Tõnis, Aarik, Lauri, Rammula, Raul, Kruusla, Vegard, Aarik, Jaan

Journal:

Thin Solid Films

Year:

2016

Language:

english

File:

PDF, 1.94 MB

english, 2016

18

Influence of oxygen precursors on atomic layer deposition of HfO2 and hafnium-titanium oxide films: comparison of O3- and H2O-based processes

Aarik, Lauri, Arroval, TÃµnis, MÃ¤ndar, Hugo, Rammula, Raul, Aarik, Jaan

Journal:

Applied Surface Science

Year:

2020

File:

PDF, 892 KB

2020

19

ChemInform Abstract: Atomic Layer Deposition of Tantalum Oxide Thin Films from Iodide Precursor.

Kaupo Kukli, Jaan Aarik, Aleks Aidla, Katarina Forsgren, Jonas Sundqvist, Anders Haarsta, Teet Uustare, Hugo Maendar, Alma-Asta Kiisler

Journal:

Year:

2001

File:

PDF, 31 KB

2001

20

Epitaxial AlGaAsSbGaSb (AlGaSb) heterostructures for injection lasers

J. A. Aarik, L. M. Dolginov, L. V. Druzhinina, P. G. Eliseev, P. A. Lǒuk, M. G. Milvidskij, Dr. B. N. Sverdlov, J. K. Friedenthal

Journal:

Crystal Research and Technology

Year:

1980

Language:

english

File:

PDF, 424 KB

english, 1980

21

Atomic Layer Deposition of Iron Oxide Thin Films and Nanotubes using Ferrocene and Oxygen as Precursors

Ma˚rten Rooth, Anders Johansson, Kaupo Kukli, Jaan Aarik, Mats Boman, Anders Hårsta

Journal:

Chemical Vapor Deposition

Year:

2008

Language:

english

File:

PDF, 193 KB

english, 2008

22

Deposition and etching of tantalum oxide films in atomic layer epitaxy process

Jaan Aarik, Aleks Aidla, Kaupo Kukli, Teet Uustare

Journal:

Journal of Crystal Growth

Year:

1994

Language:

english

File:

PDF, 240 KB

english, 1994

23

Precursor properties of calcium β-diketonate in vapor phase atomic layer epitaxy

J. Aarik, A. Aidla, A. Jaek, M. Leskelä, L. Niinistö

Journal:

Applied Surface Science

Year:

1994

Language:

english

File:

PDF, 368 KB

english, 1994

24

In situ characterization of ALE growth by reagent pulse delay times in a flow-type reactor

J. Aarik, A. Aidla, K. Kukli

Journal:

Applied Surface Science

Year:

1994

Language:

english

File:

PDF, 364 KB

english, 1994

25

Characterization of adsorption in flow type atomic layer epitaxy reactor

J. Aarik, H. Siimon

Journal:

Applied Surface Science

Year:

1994

Language:

english

File:

PDF, 457 KB

english, 1994

26

Erratum to “Characterization of adsorption in flow type atomic layer epitaxy reactor” [Appl. Surf. Sci. 81 (1994) 281]

J. Aarik, H. Siimon

Journal:

Applied Surface Science

Year:

1995

File:

PDF, 22 KB

1995

27

Photoluminescence characterization of pure and Sm3+-doped thin metaloxide films

V. Kiisk, I. Sildos, S. Lange, V. Reedo, T. Tätte, M. Kirm, J. Aarik

Journal:

Applied Surface Science

Year:

2005

Language:

english

File:

PDF, 286 KB

english, 2005

28

Influence of carrier gas pressure and flow rate on atomic layer deposition of HfO2 and ZrO2 thin films

Jaan Aarik, Aleks Aidla, Aarne Kasikov, Hugo Mändar, Raul Rammula, Väino Sammelselg

Journal:

Applied Surface Science

Year:

2006

Language:

english

File:

PDF, 277 KB

english, 2006

29

Effect of phase composition on X-ray absorption spectra of ZrO2 thin films

A. Kikas, J. Aarik, V. Kisand, K. Kooser, T. Käämbre, H. Mändar, T. Uustare, R. Rammula, V. Sammelselg, I. Martinson

Journal:

Journal of Electron Spectroscopy and Related Phenomena

Year:

2007

Language:

english

File:

PDF, 382 KB

english, 2007

30

XPS and AFM investigation of hafnium dioxide thin films prepared by atomic layer deposition on silicon

V. Sammelselg, R. Rammula, J. Aarik, A. Kikas, K. Kooser, T. Käämbre

Journal:

Journal of Electron Spectroscopy and Related Phenomena

Year:

2007

Language:

english

File:

PDF, 680 KB

english, 2007

31

Electrical properties of TiO2-based MIM capacitors deposited by TiCl4 and TTIP based atomic layer deposition processes

Boris Hudec, Kristína Hušeková, Aivar Tarre, Jeong Hwan Han, Sora Han, Alica Rosová, Woongkyu Lee, Aarne Kasikov, Seul Ji Song, Jaan Aarik, Cheol Seong Hwang, Karol Fröhlich

Journal:

Microelectronic Engineering

Year:

2011

Language:

english

File:

PDF, 408 KB

english, 2011

32

Atomic layer deposition rate, phase composition and performance of HfO2 films on noble metal and alkoxylated silicon substrates

Kaupo Kukli, Mikko Ritala, Tero Pilvi, Titta Aaltonen, Jaan Aarik, Markus Lautala, Markku Leskelä

Journal:

Materials Science and Engineering: B

Year:

2005

Language:

english

File:

PDF, 247 KB

english, 2005

33

Precursor-dependent structural and electrical characteristics of atomic layer deposited films: Case study on titanium oxide

Indrek Jõgi, Kaupo Kukli, Jaan Aarik, Aleks Aidla, Jun Lu

Journal:

Materials Science in Semiconductor Processing

Year:

2006

Language:

english

File:

PDF, 558 KB

english, 2006

34

Thin films of HfO2 and ZrO2 as potential scintillators

Marco Kirm, Jaan Aarik, Meelis Jürgens, Ilmo Sildos

Journal:

Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment

Year:

2005

Language:

english

File:

PDF, 271 KB

english, 2005

35

Luminescence of RE-ions in HfO2 thin films and some possible applications

S. Lange, V. Kiisk, V. Reedo, M. Kirm, J. Aarik, I. Sildos

Journal:

Optical Materials

Year:

2006

Language:

english

File:

PDF, 240 KB

english, 2006

36

Effects of precursors on nucleation in atomic layer deposition of HfO2

Jaan Aarik, Aleks Aidla, Arvo Kikas, Tanel Käämbre, Raul Rammula, Peeter Ritslaid, Teet Uustare, Väino Sammelselg

Journal:

Applied Surface Science

Year:

2004

Language:

english

File:

PDF, 239 KB

english, 2004

37

Transmission electron microscopy studies of HfO2 thin films grown by chloride-based atomic layer deposition

D.R.G. Mitchell, A. Aidla, J. Aarik

Journal:

Applied Surface Science

Year:

2006

Language:

english

File:

PDF, 1.97 MB

english, 2006

38

Atomic layer deposition of Cr2O3 thin films: Effect of crystallization on growth and properties

Aivar Tarre, Jaan Aarik, Hugo Mändar, Ahti Niilisk, Rainer Pärna, Raul Rammula, Teet Uustare, Arnold Rosental, Väino Sammelselg

Journal:

Applied Surface Science

Year:

2008

Language:

english

File:

PDF, 616 KB

english, 2008

39

Atomic layer deposition of HfO2: Effect of structure development on growth rate, morphology and optical properties of thin films

Raul Rammula, Jaan Aarik, Hugo Mändar, Peeter Ritslaid, Väino Sammelselg

Journal:

Applied Surface Science

Year:

2010

Language:

english

File:

PDF, 833 KB

english, 2010

40

Microstructure characterisation of ALD-grown epitaxial SnO2 thin films

J Lu, J Sundqvist, M Ottosson, A Tarre, A Rosental, J Aarik, A Hårsta

Journal:

Journal of Crystal Growth

Year:

2004

Language:

english

File:

PDF, 1.10 MB

english, 2004

41

Analytical TEM characterization of the interfacial layer between ALD HfO2 film and silicon substrate

J. Lu, J. Aarik, J. Sundqvist, K. Kukli, A. Hårsta, J.-O. Carlsson

Journal:

Journal of Crystal Growth

Year:

2005

Language:

english

File:

PDF, 322 KB

english, 2005

42

Structure and morphology of Ru films grown by atomic layer deposition from 1-ethyl-1’-methyl-ruthenocene

Kaupo Kukli, Jaan Aarik, Aleks Aidla, Teet Uustare, Indrek Jõgi, Jun Lu, Massimo Tallarida, Marianna Kemell, Alma-Asta Kiisler, Mikko Ritala, Markku Leskelä

Journal:

Journal of Crystal Growth

Year:

2010

Language:

english

File:

PDF, 1.16 MB

english, 2010

43

Atomic layer deposition of high capacitance density Ta2O5–ZrO2 based dielectrics for metal–insulator–metal structures

Indrek Jõgi, Kaupo Kukli, Mikko Ritala, Markku Leskelä, Jaan Aarik, Aleks Aidla, Jun Lu

Journal:

Microelectronic Engineering

Year:

2010

Language:

english

File:

PDF, 551 KB

english, 2010

44

Post-deposition processing and oxygen content of TiO2-based capacitors

K. Fröhlich, B. Hudec, J. Aarik, A. Tarre, D. Machajdík, A. Kasikov, K. Hušeková, Š. Gaži

Journal:

Microelectronic Engineering

Year:

2011

Language:

english

File:

PDF, 318 KB

english, 2011

45

The influence of a waveguiding structure on the excitonic luminescence of anatase thin films

V. Kiisk, I. Sildos, O. Sild, J. Aarik

Journal:

Optical Materials

Year:

2004

Language:

english

File:

PDF, 469 KB

english, 2004

46

Raman and Brillouin scattering spectroscopy studies of atomic layer-deposited ZrO2 and HfO2 thin films

S.N. Tkachev, M.H. Manghnani, A. Niilisk, J. Aarik, H. Mändar

Journal:

Spectrochimica Acta Part A: Molecular and Biomolecular Spectroscopy

Year:

2005

Language:

english

File:

PDF, 120 KB

english, 2005

47

Structural characterization of TiO2–Cr2O3 nanolaminates grown by atomic layer deposition

V. Sammelselg, A. Tarre, J. Lu, J. Aarik, A. Niilisk, T. Uustare, I. Netšipailo, R. Rammula, R. Pärna, A. Rosental

Journal:

Surface and Coatings Technology

Year:

2010

Language:

english

File:

PDF, 1.01 MB

english, 2010

48

Optical characterization of HfO2 thin films grown by atomic layer deposition

Jaan Aarik, Hugo Mändar, Marco Kirm, Lembit Pung

Journal:

Thin Solid Films

Year:

2004

Language:

english

File:

PDF, 214 KB

english, 2004

49

Engineering structure and properties of hafnium oxide films by atomic layer deposition temperature

Kaupo Kukli, Jaan Aarik, Teet Uustare, Jun Lu, Mikko Ritala, Aleks Aidla, Lembit Pung, Anders Hårsta, Markku Leskelä, Arvo Kikas, Väino Sammelselg

Journal:

Thin Solid Films

Year:

2005

Language:

english

File:

PDF, 604 KB

english, 2005

50

Effect of preparation conditions on properties of atomic layer deposited TiO2 films in Mo–TiO2–Al stacks

Indrek Jõgi, Jaan Aarik, Matti Laan, Jun Lu, Kaupo Kukli, Henn Käämbre, Timo Sajavaara, Teet Uustare

Journal:

Thin Solid Films

Year:

2006

Language:

english

File:

PDF, 493 KB

english, 2006

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